Ab initio calculations predict that Be is a shallow acceptor in GaN. Its thermal ionization energy is 0.06 eV in wurtzite GaN; the level is valence resonant in the zincblende phase. Be incorporation is severely limited by the formation of Be3N2. It is shown, however, that co-incorporation with reactive species can enhance the solubility. H-assisted incorporation should lead to high doping levels in metal-organic-chemical-vapor deposition growth after post-growth annealing at about 850 K. Be-O co-incorporation produces high Be and O concentrations at molecular beam epitaxy growth temperatures. (C) 1997 American Institute of Physics.

Theoretical evidence for efficient p-type doping of GaN using beryllium

BERNARDINI, FABIO;FIORENTINI, VINCENZO;BOSIN, ANDREA
1997-01-01

Abstract

Ab initio calculations predict that Be is a shallow acceptor in GaN. Its thermal ionization energy is 0.06 eV in wurtzite GaN; the level is valence resonant in the zincblende phase. Be incorporation is severely limited by the formation of Be3N2. It is shown, however, that co-incorporation with reactive species can enhance the solubility. H-assisted incorporation should lead to high doping levels in metal-organic-chemical-vapor deposition growth after post-growth annealing at about 850 K. Be-O co-incorporation produces high Be and O concentrations at molecular beam epitaxy growth temperatures. (C) 1997 American Institute of Physics.
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11584/103615
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