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EnglishThe dissolution of boron-interstitial clusters (BICs) in crystalline silicon, often formed after ion implantation, is investigated by temperature accelerated dynamics of their formation using the Si–B Stillinger-Weber potential. We find that the dominant breakup event for small BICs is the emission of either Si mono- or di-interstitials, though the dominant reaction for the reactivation of boron is via emission of a boron interstitial defect B1I1. Most reactions are well approximated by the assumption that they are diffusion limited. Finally, the rate limiting step for breakup of clusters with three B atoms involves the B3I2 cluster, which also dissolves via emission of B1I1.
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| Titolo: | Atomistic study of the dissolution of small boron interstitial clusters in c-Si | |
| Autori: | ||
| Data di pubblicazione: | 2005 | |
| Rivista: | ||
| Abstract: | The dissolution of boron-interstitial clusters (BICs) in crystalline silicon, often formed after ion implantation, is investigated by temperature accelerated dynamics of their formation using the Si–B Stillinger-Weber potential. We find that the dominant breakup event for small BICs is the emission of either Si mono- or di-interstitials, though the dominant reaction for the reactivation of boron is via emission of a boron interstitial defect B1I1. Most reactions are well approximated by the assumption that they are diffusion limited. Finally, the rate limiting step for breakup of clusters with three B atoms involves the B3I2 cluster, which also dissolves via emission of B1I1. | |
| Handle: | http://hdl.handle.net/11584/15663 | |
| Tipologia: | 1.1 Articolo in rivista |
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