Films produced by assembling bare gold clusters well beyond the electrical percolation threshold show a resistive switching behavior whose investigation has started only recently. Here we address the challenge to charaterize the resistance of a nanogranular film starting from limited information on the structure at the microscopic scale by the means of Bruggeman’s approach to multicomponent media, within the framework of effective medium approximations. The approach is used to build a model that proves that the observed resistive switching can be explained by thermally regulated local structural rearrangements.

Modeling resistive switching in nanogranular metal films

Tarantino, Walter
Primo
Methodology
;
Colombo, Luciano
Ultimo
Supervision
2020-01-01

Abstract

Films produced by assembling bare gold clusters well beyond the electrical percolation threshold show a resistive switching behavior whose investigation has started only recently. Here we address the challenge to charaterize the resistance of a nanogranular film starting from limited information on the structure at the microscopic scale by the means of Bruggeman’s approach to multicomponent media, within the framework of effective medium approximations. The approach is used to build a model that proves that the observed resistive switching can be explained by thermally regulated local structural rearrangements.
2020
nano granular metallic films; resistive switching; effective medium approach
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11584/306272
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