In this paper we report the deposition of epitaxial thin films of Nd1-xSrxCoO3 with x = 0, 0.2, and 0.5 on single-crystalline substrates (SrTiO3 and LaAlO3) carried out by means of rf-magnetron sputtering. The deposited films are all completely oriented and epitaxial and characterized by a nanocrystalline morphology. As-deposited films have an average roughness around 1 nm while after the thermal treatment this increases up to 20 nm while preserving the nanocrystalline morphology. All the films deposited on SrTiO3 have shown to be under a certain degree of tensile strain while those on the LaAlO3 experience a compressive strain, thus suggesting that at about 50 nm the films are not fully relaxed, even after the thermal treatment. For the x = 0.2 composition three different thicknesses have been investigated, revealing an increased strain for the thinner films.

Radio Frequency Sputter Deposition of Epitaxial Nanocrystalline Nd1-xSrxCoO3 Thin Films

SANNA, CARLA;LAMPIS, NATHASCIA;GEDDO LEHMANN, ALESSANDRA;
2006-01-01

Abstract

In this paper we report the deposition of epitaxial thin films of Nd1-xSrxCoO3 with x = 0, 0.2, and 0.5 on single-crystalline substrates (SrTiO3 and LaAlO3) carried out by means of rf-magnetron sputtering. The deposited films are all completely oriented and epitaxial and characterized by a nanocrystalline morphology. As-deposited films have an average roughness around 1 nm while after the thermal treatment this increases up to 20 nm while preserving the nanocrystalline morphology. All the films deposited on SrTiO3 have shown to be under a certain degree of tensile strain while those on the LaAlO3 experience a compressive strain, thus suggesting that at about 50 nm the films are not fully relaxed, even after the thermal treatment. For the x = 0.2 composition three different thicknesses have been investigated, revealing an increased strain for the thinner films.
File in questo prodotto:
Non ci sono file associati a questo prodotto.

I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.

Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11584/87225
 Attenzione

Attenzione! I dati visualizzati non sono stati sottoposti a validazione da parte dell'ateneo

Citazioni
  • ???jsp.display-item.citation.pmc??? ND
  • Scopus 8
  • ???jsp.display-item.citation.isi??? 8
social impact