By combining an ultra-thin dielectric layer with a self-aligning process, an ultra-low voltage Organic Thin-Film Transistor (OTFT) with a 100 kHz cutoff frequency was obtained. The devices are fabricated using a single-mask, photolithographic self-alignment technique compatible with the use of standard photoresists and not requiring any further chemical treatment. This technique allows a dramatic reduction of the parasitic capacitances thus leading to a remarkable increase of the cutoff frequency, even with organic semiconductors with a relatively low mobility. These characteristics make the reported approach suitable for the fabrication of basic building blocks for high frequency applications. In this paper, the main electrical parameters of ultra-low voltage, self-aligned devices are reported, and their complete frequency characterization is provided.

Towards high frequency performances of ultra-low voltage OTFTs: Combining self-alignment and hybrid, nanosized dielectrics

LAI, STEFANO;COSSEDDU, PIERO;BARBARO, MASSIMO;BONFIGLIO, ANNALISA
2013-01-01

Abstract

By combining an ultra-thin dielectric layer with a self-aligning process, an ultra-low voltage Organic Thin-Film Transistor (OTFT) with a 100 kHz cutoff frequency was obtained. The devices are fabricated using a single-mask, photolithographic self-alignment technique compatible with the use of standard photoresists and not requiring any further chemical treatment. This technique allows a dramatic reduction of the parasitic capacitances thus leading to a remarkable increase of the cutoff frequency, even with organic semiconductors with a relatively low mobility. These characteristics make the reported approach suitable for the fabrication of basic building blocks for high frequency applications. In this paper, the main electrical parameters of ultra-low voltage, self-aligned devices are reported, and their complete frequency characterization is provided.
2013
Photolithographic self-alignment; Organic thin-film transistors; Ultra-low voltage devices; High frequency applications
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11584/91127
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