The fabrication of porous Si-based Er-doped light emitting devices is a very promising developing field for all-silicon light emitters. However, while luminescence of Er-doped porous silicon devices has been demonstrated, very little attention has been devoted to the doping process itself. We have undertaken a detailed study of this process examining the porous silicon matrix from several points of view, during and after the doping. In particular, we have found that the Er doping process shows a threshold level which, as evidenced by the cross correlation of the various techniques used, does depend on the sample thickness and on the doping parameters.

Characterization of Er in porous Si

MULA, GUIDO;FALQUI, ANDREA
2012

Abstract

The fabrication of porous Si-based Er-doped light emitting devices is a very promising developing field for all-silicon light emitters. However, while luminescence of Er-doped porous silicon devices has been demonstrated, very little attention has been devoted to the doping process itself. We have undertaken a detailed study of this process examining the porous silicon matrix from several points of view, during and after the doping. In particular, we have found that the Er doping process shows a threshold level which, as evidenced by the cross correlation of the various techniques used, does depend on the sample thickness and on the doping parameters.
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11584/96723
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